The site-specific reactivity of isopropanol in aqueous silicon etching: Controlling morphology with surface chemistry
Journal of Chemical Physics, ISSN: 0021-9606, Vol: 111, Issue: 20, Page: 9125-9128
1999
- 37Citations
- 11Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Article Description
The site-specific rates of isopropanol reaction on Si(111) were studied by kinetic competition with an etchant of known anisotropy and quantified using concentration-dependent changes in the etched surface morphology using a combination of STM measurements and kinetic Monte Carlo simulations. The isopropoxide ion was identified as the active species. © 1999 American Institute of Physics.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0001336468&origin=inward; http://dx.doi.org/10.1063/1.479386; https://pubs.aip.org/jcp/article/111/20/9125/183472/The-site-specific-reactivity-of-isopropanol-in; http://aip.scitation.org/doi/10.1063/1.479386; https://aip.scitation.org/action/captchaChallenge?redirectUrl=https%3A%2F%2Faip.scitation.org%2Fdoi%2F10.1063%2F1.479386
AIP Publishing
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