Investigation of ion beam induced nanopattern formation near the threshold energy
Applied Physics Letters, ISSN: 0003-6951, Vol: 103, Issue: 16
2013
- 18Citations
- 10Captures
Metric Options: Counts1 Year3 YearSelecting the 1-year or 3-year option will change the metrics count to percentiles, illustrating how an article or review compares to other articles or reviews within the selected time period in the same journal. Selecting the 1-year option compares the metrics against other articles/reviews that were also published in the same calendar year. Selecting the 3-year option compares the metrics against other articles/reviews that were also published in the same calendar year plus the two years prior.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Article Description
The nanoscale ripple formation on mica surface is studied at off-normal ion incidence angles θ under Ar bombardment at energies E close to or below the threshold energy for physical sputtering. A phase diagram for domains of pattern formation is presented as a function of θ and E, which shows the stability/instability bifurcation angle close to 40°. The instability grows as ripple-like structures at lower angles, while at grazing angles the pattern emerges as dense array of needles. The results support the pure mass redistribution based paradigm for surface patterning as the erosion due to sputtering essentially tends to zero. © 2013 AIP Publishing LLC.
Bibliographic Details
Provide Feedback
Have ideas for a new metric? Would you like to see something else here?Let us know