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Ultrathin MgB films fabricated on AlO substrate by hybrid physical-chemical vapor deposition with high T and J

Superconductor Science and Technology, ISSN: 0953-2048, Vol: 24, Issue: 1
2011
  • 34
    Citations
  • 0
    Usage
  • 15
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    34
    • Citation Indexes
      34
  • Captures
    15

Article Description

Ultrathin MgB superconducting films with a thickness down to 7.5 nm are epitaxially grown on (0001) AlO substrate by a hybrid physical-chemical vapor deposition method. The films are phase-pure, oxidation-free and continuous. The 7.5 nm thin film shows a T(0) of 34 K, which is so far the highest T(0) reported in MgB with the same thickness. The critical current density of ultrathin MgB films below 10 nm is demonstrated for the first time as J ~ 106 A cm for the above 7.5 nm sample at 16 K. Our results reveal the excellent superconducting properties of ultrathin MgB films with thicknesses between 7.5 and 40 nm on Al O substrate. © 2011 IOP Publishing Ltd.

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