Local arrangement of silylene groups on Si(100)2×1 aftersdecomposition
Physical Review B - Condensed Matter and Materials Physics, ISSN: 1550-235X, Vol: 55, Issue: 7, Page: 4659-4664
1997
- 21Citations
- 6Captures
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Article Description
The interaction between Si(100)2×1 and (Formula presented) under UHV chemical vapor deposition conditions between 550 and 690 K is studied with high-resolution scanning tunneling microscopy and kinetic model calculations. In addition to small anisotropic Si islands and patches of hydrogen-terminated substrate, metastable cross-shaped structural tetramer units are formed in this temperature region. These tetramers are interpreted as a combination of four (Formula presented) groups connecting four Si substrate atoms, and their coverage is correlated with the decomposition kinetics of (Formula presented) . © 1997 The American Physical Society.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0039135815&origin=inward; http://dx.doi.org/10.1103/physrevb.55.4659; https://link.aps.org/doi/10.1103/PhysRevB.55.4659; http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.55.4659/fulltext; http://link.aps.org/article/10.1103/PhysRevB.55.4659
American Physical Society (APS)
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