Topography and instability of monolayers near domain boundaries
Physical Review E - Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics, ISSN: 1063-651X, Vol: 63, Issue: 6, Page: 061602
2001
- 61Citations
- 39Captures
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Metrics Details
- Citations61
- Citation Indexes61
- 61
- CrossRef35
- Captures39
- Readers39
- 39
Article Description
We theoretically study the topography of a biphasic surfactant monolayer in the vicinity of domain boundaries. The differing elastic properties of the two phases generally lead to a nonflat topography of “mesas,” where domains of one phase are elevated with respect to the other phase. The mesas are steep but low, having heights of up to 10 nm. As the monolayer is laterally compressed, the mesas develop overhangs and eventually become unstable at a surface tension of about [Formula Presented] being the difference in spontaneous curvature and K a bending modulus). In addition, the boundary is found to undergo a topography-induced rippling instability upon compression, if its line tension is smaller than about [formula presented] The effect of diffuse boundaries on these features and the topographic behavior near a critical point are also examined. We discuss the relevance of our findings to several experimental observations related to surfactant monolayers: (i) small topographic features recently found near domain boundaries; (ii) folding behavior observed in mixed phospholipid monolayers and model lung surfactants; (iii) roughening of domain boundaries seen under lateral compression; (iv) the absence of biphasic structures in tensionless surfactant films. © 2001 The American Physical Society.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0035364486&origin=inward; http://dx.doi.org/10.1103/physreve.63.061602; http://www.ncbi.nlm.nih.gov/pubmed/11415114; https://link.aps.org/doi/10.1103/PhysRevE.63.061602; http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevE.63.061602/fulltext; http://link.aps.org/article/10.1103/PhysRevE.63.061602
American Physical Society (APS)
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