Plasma enhanced direct current planar magnetron sputtering technique employing a twinned microwave electron cyclotron resonance plasma source
Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films, ISSN: 0734-2101, Vol: 19, Issue: 2, Page: 425-428
2001
- 9Citations
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Article Description
The direct current discharge characteristics of a planar magnetron was studied. The discharge was enhanced by a twinned microwave electron cyclotron resonance plasma source. The sputtering discharge characteristics revealed a combined mode of voltage and current at a pressure as low as 0.007 Pa. The synthesis of carbon-nitride thin films via magnetron sputtering were described.
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