Surface modification of phyllosilicate minerals by fluorination methods
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 0734-2101, Vol: 28, Issue: 2, Page: 373-381
2010
- 13Citations
- 8Captures
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Article Description
The effect of fluorination on various types of phyllosilicate minerals has been investigated. Two different fluorination techniques have been used: direct F gas and cold radio frequency plasma involving c -C F or O / CF mixtures. The modifications of the surface composition and properties have been followed mostly by x-ray photoelectron spectroscopy (XPS). Depending of the fluorination reagents, a reactive etching process involving M -F bonding occurs (direct F gas; O - CF rf plasma) or a carbon fluoride deposition takes place (c -C F rf plasma). In the case of F -gas treated minerals, Si 2p XPS signal accounts for the presence of fluorinated Si environments. © 2010 American Vacuum Society.
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