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Surface modification of phyllosilicate minerals by fluorination methods

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 0734-2101, Vol: 28, Issue: 2, Page: 373-381
2010
  • 13
    Citations
  • 0
    Usage
  • 8
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    13
    • Citation Indexes
      13
  • Captures
    8

Article Description

The effect of fluorination on various types of phyllosilicate minerals has been investigated. Two different fluorination techniques have been used: direct F gas and cold radio frequency plasma involving c -C F or O / CF mixtures. The modifications of the surface composition and properties have been followed mostly by x-ray photoelectron spectroscopy (XPS). Depending of the fluorination reagents, a reactive etching process involving M -F bonding occurs (direct F gas; O - CF rf plasma) or a carbon fluoride deposition takes place (c -C F rf plasma). In the case of F -gas treated minerals, Si 2p XPS signal accounts for the presence of fluorinated Si environments. © 2010 American Vacuum Society.

Bibliographic Details

Alain Tressaud; Christine Labrug̀re; Etienne Durand; H́l̀ne Serier; Larisa P. Demyanova

American Vacuum Society

Physics and Astronomy; Materials Science

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