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Visible light-induced photocatalytic properties of WO films deposited by dc reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 0734-2101, Vol: 30, Issue: 3
2012
  • 18
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Metrics Details

  • Citations
    18
    • Citation Indexes
      18
  • Captures
    17

Article Description

The authors examined the photocatalytic activity of WO films (thickness 500-600 nm) deposited on a fused quartz substrate heated at 350-800 °C by dc reactive magnetron sputtering using a W metal target under the O gas pressure from 1.0 to 5.0 Pa. Films deposited at 800 °C under 5.0 Pa have excellent crystallinity of triclinic, P1(1) structure and a large surface area, as confirmed by x-ray diffraction, scanning electron microscopy, and atomic force microscopy. Exposure of acetaldehyde (CH CHO) adsorbed onto the film surface to ultraviolet, visible, or standard fluorescence light induces oxidative photocatalytic decomposition indicated by a decrease in CH CHO concentration and generation of CO gas. For all three types of irradiation, concentration ratio of decreased CH CHO to increased CO is about 1:1, suggesting the possible presence of intermediates. The sputter-deposited WO film can be a good candidate as a visible light-responsive photocatalyst. © 2012 American Vacuum Society.

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