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Optical properties of titania/silica multilayer filters prepared by helicon plasma sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 0734-2101, Vol: 16, Issue: 5, Page: 2926-2930
1998
  • 15
    Citations
  • 0
    Usage
  • 5
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    15
    • Citation Indexes
      14
    • Patent Family Citations
      1
      • 1
  • Captures
    5

Article Description

Seven-layer optical multilayer filters with alternating layers of titania and silica were fabricated by helicon plasma sputtering at room temperature. The reflectance of the filters around the design wavelengths of 800 and 1300 nm are up to 95.80% and 95.32%, respectively. Their reflected bands have the full widths at half maximum of about 360 and 600 nm, respectively. The measured transmittance spectra correspond well with the calculated results based on the optical multilayer film theory with measured refractive indices of 2.44 and 1.48 for TiO and SiO, respectively. Microstructures of the TiO and SiO films and TiO/SiO multilayer films were investigated. © 1998 American Vacuum Society.

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