PlumX Metrics
Embed PlumX Metrics

Epitaxial metals for interconnects beyond Cu

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 1520-8559, Vol: 38, Issue: 3
2020
  • 34
    Citations
  • 0
    Usage
  • 30
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    34
    • Citation Indexes
      34
  • Captures
    30

Article Description

Experimentally measured resistivity of Co(0001) and Ru(0001) single crystal thin films, grown on c-plane sapphire substrates, as a function of thickness is modeled using the semiclassical model of Fuchs-Sondheimer. The model fits show that the resistivity of Ru would cross below that for Co at a thickness of approximately 20 nm. For Ru films with thicknesses above 20 nm, transmission electron microscopy evidences threading and misfit dislocations, stacking faults, and deformation twins. Exposure of Co films to ambient air and the deposition of oxide layers of SiO, MgO, AlO, and CrO on Ru degrade the surface specularity of the metallic layer. However, for the Ru films, annealing in a reducing ambient restores the surface specularity. Epitaxial electrochemical deposition of Co on epitaxially deposited Ru layers is used as an example to demonstrate the feasibility of generating epitaxial interconnects for back-end-of-line structures. An electron transport model based on a tight-binding approach is described, with Ru interconnects used as an example. The model allows conductivity to be computed for structures comprising large ensembles of atoms (10-10), scales linearly with system size, and can also incorporate defects.

Bibliographic Details

Katayun Barmak; Sameer Ezzat; Ryan Gusley; Atharv Jog; Sit Kerdsongpanya; Asim Khaniya; Erik Milosevic; William Richardson; Kadir Sentosun; Amirali Zangiabadi; Daniel Gall; William E. Kaden; Eduardo R. Mucciolo; Patrick K. Schelling; Alan C. West; Kevin R. Coffey

American Vacuum Society

Physics and Astronomy; Materials Science

Provide Feedback

Have ideas for a new metric? Would you like to see something else here?Let us know