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Effects of process parameters on the optical constants of highly textured VO thin films

Optics and Spectroscopy (English translation of Optika i Spektroskopiya), ISSN: 1562-6911, Vol: 117, Issue: 3, Page: 423-427
2014
  • 7
    Citations
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    Usage
  • 12
    Captures
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    Mentions
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Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    7
    • Citation Indexes
      7
  • Captures
    12

Article Description

The optical properties of the highly-textured VO thin-films grown on Si(100) by sputter-deposition at various oxygen reactive-pressures were investigated in detail. The profiles of the optical constants, namely the refractive index and extinction coefficient, of VO films were evaluated in the photon-energy range of 1–5 eV. At photon-energy above 2.5 eV, the dispersion behavior in optical constants is explained based on Lorentz-Drude model. The refractive index dispersion fits to a Cauchy’s relation at photon-energy below 2.5 eV, where the VO-film is mostly transparent. The optical transitions across the bandgap occur at energy ∼2.5–3.2 eV depending on the VO growth conditions and film-microstructure. The highly-textured and c-axis oriented VO-films, fabricated under optimum conditions of temperature and oxygen partial pressure, exhibit excellent optical characteristics similar to VO single crystals.

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