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Effect of surface pH on electrodeposited Ni films

Journal of the Electrochemical Society, ISSN: 0013-4651, Vol: 153, Issue: 7
2006
  • 46
    Citations
  • 0
    Usage
  • 32
    Captures
  • 0
    Mentions
  • 75
    Social Media
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Metrics Details

  • Citations
    46
    • Citation Indexes
      46
  • Captures
    32
  • Social Media
    75
    • Shares, Likes & Comments
      75
      • Facebook
        75

Article Description

Ni metal was potentiostatically electrodeposited on a vertical plane cathode in a Watts bath in order to determine the effect of the cathode surface pH on the Ni film microstructure. Polarization curves and current efficiencies were measured at pH values of 1.5, 3.4, and 5.5. The surface pH value (pHs) was estimated from the measured partial current density for hydrogen gas evolution based on a steady-state one-dimensional mass transfer model. Any species relating to the buffering function through the dissociation reactions (HSO4-, H3 BO3, Ni4 (OH) 4 4+, H3 O+, OH-) were taken into account. The pHs abruptly rose to above 6 as the partial current density for H2 gas evolution increased. The preferred orientation of electrodeposited Ni thin film was plotted in electrode potential- pHs diagram. It was found that the transition boundary between {110} and {100} preferred orientations was located along a ridge 500 mV below the H+ H2 equilibrium potential line. This relationship suggests that the dissolved hydrogen atoms in Ni metal are partly responsible for the evolution of structural texture of the Ni films. © 2006 The Electrochemical Society. All rights reserved.

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