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Anti-reflective nano- and micro-structures on 4h-sic for photodiodes

Nanoscale Research Letters, ISSN: 1556-276X, Vol: 6, Issue: 1, Page: 236
2011
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Article Description

In this study, nano-scale honeycomb-shaped structures with anti-reflection properties were successfully formed on SiC. The surface of 4H-SiC wafer after a conventional photolithography process was etched by inductively coupled plasma. We demonstrate that the reflection characteristic of the fabricated photodiodes has significantly reduced by 55% compared with the reference devices. As a result, the optical response I/I of the 4H-SiC photodiodes were enhanced up to 178%, which can be ascribed primarily to the improved light trapping in the proposed nano-scale texturing. © 2011 Kang et al.

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