Interferometric lithography for nanoscale feature patterning: A comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference
Applied Optics, ISSN: 1539-4522, Vol: 49, Issue: 35, Page: 6710-6717
2010
- 40Citations
- 39Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Metrics Details
- Citations40
- Citation Indexes39
- 39
- CrossRef36
- Patent Family Citations1
- 1
- Captures39
- Readers39
- 39
Article Description
In this paper, we experimentally demonstrate and compare single-exposure multiple-beam interference lithography based on conventional laser interference, evanescent wave interference, and surface plasmon interference. The proposed two-beam and four-beam interference approaches are carried out theoretically and verified experimentally, employing the proposed configurations so as to realize the patterning of one- and two-dimensional periodic features on photoresists. A custom-fabricated grating is employed in the configuration in order to achieve two- and four-beam interference. © 2010 Optical Society of America.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=78650478275&origin=inward; http://dx.doi.org/10.1364/ao.49.006710; http://www.ncbi.nlm.nih.gov/pubmed/21151227; https://www.osapublishing.org/abstract.cfm?URI=ao-49-35-6710; https://www.osapublishing.org/viewmedia.cfm?URI=ao-49-35-6710&seq=0; https://opg.optica.org/abstract.cfm?URI=ao-49-35-6710; https://dx.doi.org/10.1364/ao.49.006710; https://opg.optica.org/ao/abstract.cfm?uri=ao-49-35-6710
The Optical Society
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