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Surface Finishing Evolution of Freeform Fused Silica by He:(Sf/O) Based Medium-Pressure Plasma Process and Wet Chemical Etching

SSRN, ISSN: 1556-5068
2023
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    36

Article Description

The rising demand for precision optics widely employed in ground and space-based astronomical instruments and other scientific instrumentation requires highly efficient advanced fabrication methods. Due to complex-shaped fused silica substrate surfaces like freeform or aspheres with strong curvatures or very small-sized components, a novel non-contact medium-pressure plasma-based process is developed to finish optical components. The present study critically compares the polished optical surfaces of a prism with a medium-pressure plasma process and wet chemical etching to provide insight into their smoothing. The experimental results show that surface roughness (S) slightly increases from 0.54 to 2.61 nm and 0.53 to 0.57 nm at 5 and 20 mbar total pressures, respectively, using a plasma process without surface contamination. However, wet chemical etching increases surface roughness (S) from 0.52 to 15.9 nm. Moreover, the substrates' surface morphology, elemental composition, and surface topography are analyzed using FESEM, EDX, and AFM.

Bibliographic Details

Hari Narayan Singh Yadav; Manas Das

Elsevier BV

Multidisciplinary; Optical material; plasma process; wet chemical etching; Surface roughness; FESEM; EDX

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