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A Quick Diagnostic Method for Corrosion-Inhibition Balance and a Green Slurry for Copper Chemical Mechanical Polishing

SSRN, ISSN: 1556-5068
2024
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Article Description

In this paper, a green inhibitor, adenine, is introduced into the Cu-CMP slurry to prevent the toxic ingestion in the CMP process. Moreover, in order to effectively optimize and control the copper chemical mechanical polishing based on the corrosion-inhibition balance, an expression is proposed to diagnostic the balance quickly via the least square fitting of the experimental data. Based on the corrosion-inhibition balance optimization, a pH-neutral slurry incorporating adenine with a high material removal rate (MRR > 600 nm/min) as well as a low surface roughness (Ra < 1 nm) is achieved. The newly developed slurry and the diagnostic method for the corrosion-inhibition balance should be promising for designing the green slurry for Cu-CMP.

Bibliographic Details

Jiale Zhang; Ning Wang; Jianhang Yin; Pengli Zhu; Tao Zhao

Elsevier BV

Multidisciplinary; Chemical mechanical polishing; Inhibitor; Material removal rate; Electrochemical analysis

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