A Quick Diagnostic Method for Corrosion-Inhibition Balance and a Green Slurry for Copper Chemical Mechanical Polishing
SSRN, ISSN: 1556-5068
2024
- 96Usage
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Article Description
In this paper, a green inhibitor, adenine, is introduced into the Cu-CMP slurry to prevent the toxic ingestion in the CMP process. Moreover, in order to effectively optimize and control the copper chemical mechanical polishing based on the corrosion-inhibition balance, an expression is proposed to diagnostic the balance quickly via the least square fitting of the experimental data. Based on the corrosion-inhibition balance optimization, a pH-neutral slurry incorporating adenine with a high material removal rate (MRR > 600 nm/min) as well as a low surface roughness (Ra < 1 nm) is achieved. The newly developed slurry and the diagnostic method for the corrosion-inhibition balance should be promising for designing the green slurry for Cu-CMP.
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