Structure and Mechanical Properties of Nanolayered Tі–B/C Films
Journal of Superhard Materials, ISSN: 1934-9408, Vol: 44, Issue: 6, Page: 405-412
2022
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Article Description
Abstract: Nanolayered Tі–B/C films are deposited by sequential DC magnetron sputtering of TіB and graphite targets. The Si(100) platelets preliminarily heated to 400°C are used as substrates to which negative bias voltage of 50 V is applied. The operating parameters remain unchanged for the TіB target, whereas the sputtering current is varied within 50–200 mA for the graphite target. The structure, chemical bonding, Knoop hardness, and friction coefficient as functions of the sputtering current (I) at the graphite target are studied by the methods of XRD, XPS, indentation, and tribological testing. The crystalline phase is detected in the films structure, which differs from that for TіB. The film deposited at І = 150 mA exhibits the maximum hardness, and the film deposited at І = 200 mA has the minimum friction coefficient.
Bibliographic Details
Allerton Press
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