PlumX Metrics
Embed PlumX Metrics

Structural and optical properties of luminescent copper(I) chloride thin films deposited by sequentially pulsed chemical vapour deposition

Coatings, ISSN: 2079-6412, Vol: 8, Issue: 10
2018
  • 13
    Citations
  • 0
    Usage
  • 16
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    13
    • Citation Indexes
      13
  • Captures
    16

Article Description

Sequentially pulsed chemical vapour deposition was used to successfully deposit thin nanocrystalline films of copper(I) chloride using an atomic layer deposition system in order to investigate their application to UV optoelectronics. The films were deposited at 125 °C using [Bis(trimethylsilyl)acetylene](hexafluoroacetylacetonato)copper(I) as a Cu precursor and pyridine hydrochloride as a new Cl precursor. The films were analysed by XRD, X-ray photoelectron spectroscopy (XPS), SEM, photoluminescence, and spectroscopic reflectance. Capping layers of aluminium oxide were deposited in situ by ALD (atomic layer deposition) to avoid environmental degradation. The film adopted a polycrystalline zinc blende-structure. The main contaminants were found to be organic materials from the precursor. Photoluminescence showed the characteristic free and bound exciton emissions from CuCl and the characteristic exciton absorption peaks could also be detected by reflectance measurements.

Bibliographic Details

Krumpolec, Richard; Homola, Tomáš; Cameron, David; Humlíček, Josef; Caha, Ondřej; Kuldová, Karla; Zazpe, Raul; Přikryl, Jan; Macak, Jan

MDPI AG

Physics and Astronomy; Materials Science

Provide Feedback

Have ideas for a new metric? Would you like to see something else here?Let us know