Anti-impact material properties of UV-LIGA multi-layered electroformed nickel
Guangxue Jingmi Gongcheng/Optics and Precision Engineering, ISSN: 1004-924X, Vol: 23, Issue: 4, Page: 1044-1052
2015
- 3Citations
- 2Captures
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Metrics Details
- Citations3
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- Captures2
- Readers2
Article Description
To explore the mechanical reliability of multi-layered electroformed nickel prepared by UV-LIGA (Ultraviolet Lithography, Galvanoformung, Abformung) multi-layered manufacturing technology, the anti-impact material properties of the multi-layered electroformed nickel were analyzed. High-speed impact tests for the multi-layered electroformed nickel were completed by adopting an impact testing device and a signal acquisition system. The experimental results show that the cumulative failure probability - peak acceleration curve approximately fits the Weibull statistical distribution, the Weibull coefficient is 7.6 and the reference acceleration is 21 300g. When the acceleration is 12 000-18 000g, it shows a higher reliability; when that is 12000-18 000g, the cumulative failure probability increases greatly; however the reliability is declines rapidly at acceleration more than 24000g. A Scanning Electron Microscopy(SEM) was used to observe the samples and the results show that the delamination, fracture, plastic deformation and adhesion are the main failure modes. Finally, the failure causes were analyzed and corresponding optimization methods were proposed to improve the process of UV-LIGA multi-layered electroformed nickel, which verifies that the experiments provide bases for design of a multi layer structure of UV-LIGA.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84930455593&origin=inward; http://dx.doi.org/10.3788/ope.20152304.1044; http://www.opticsjournal.net/Abstract.htm?id=OJ150520000158fMiPlR; http://sciencechina.cn/gw.jsp?action=cited_outline.jsp&type=1&id=5413620&internal_id=5413620&from=elsevier; https://dx.doi.org/10.3788/ope.20152304.1044; http://www.opticsjournal.net/Articles/Abstract?aid=OJ150520000158fMiPlR
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
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