Interface reaction behavior between Mn and SiO formed by RF sputter deposition
Key Engineering Materials, ISSN: 1662-9795, Vol: 508, Page: 48-51
2012
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Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
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Conference Paper Description
The present work investigated the effects of adsorbed moisture in substrates on the growth of a self-forming barrier layer between Mn and SiO . In order to control the adsorbed moisture, the substrates of TEOS-SiO/Si were pre-annealed in vacuum at various temperatures. Then, Mn thin films were deposited on the substrate with or without pre-annealing. The results of interface reaction after additional post-annealing indicated that an interface reaction layer becomes thinner with decreasing the adsorbed moisture in the SiO substrates. © (2012) Trans Tech Publications, Switzerland.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84859716642&origin=inward; http://dx.doi.org/10.4028/www.scientific.net/kem.508.48; https://www.scientific.net/KEM.508.48; http://www.scientific.net/KEM.508.48; http://www.scientific.net/KEM.508.48.pdf; https://dx.doi.org/10.4028/www.scientific.net/kem.508.48
Trans Tech Publications, Ltd.
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