Roughness and uniformity control during wet etching of molybdenum
Solid State Phenomena, ISSN: 1662-9779, Vol: 314 SSP, Page: 295-301
2021
- 9Citations
- 7Captures
Metric Options: CountsSelecting the 1-year or 3-year option will change the metrics count to percentiles, illustrating how an article or review compares to other articles or reviews within the selected time period in the same journal. Selecting the 1-year option compares the metrics against other articles/reviews that were also published in the same calendar year. Selecting the 3-year option compares the metrics against other articles/reviews that were also published in the same calendar year plus the two years prior.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Conference Paper Description
Abstract. In this work the wet etching of molybdenum thin films was investigated for applications requiring controlled recess without roughening or pattern loading. First, continuous etching of Mo in alkaline and oxidative peroxide solutions was studied. Then, additives like glycine and diethylenetriamine were used and their effect on etch rate and roughness was assessed. Finally, we evaluated if the requirements for a stepwise etching approach for Mo recess using peroxide or ozonate water as the oxidizing step and ammonia as the oxide dissolution agent were met.
Bibliographic Details
Trans Tech Publications, Ltd.
Provide Feedback
Have ideas for a new metric? Would you like to see something else here?Let us know